CVD Diamond Deposition Reactors

Seki Reactor Seki Reactor

Seki Clamshell - This is a state-of-the-art Seki 6 kW clamshell reactor which can deposit polycrystalline or single-crystal diamond at high rates onto substrates upto 6-inches in diameter. It is shared between Prof Martin Kuball's thermometric group in Physics and the CVD diamond group in Chemistry.

Seki (another view) - another view of the Seki reactor. It will be used to grow diamond onto standard Si substrates, but also to develop process that allow diamond to be deposited onto more exotic materials such as GaN and gallium oxide for thermal management applications.
Undoped HFCVD reactor B-doped HFCVD reactor

HF Reactor 1 - a small hot filament CVD diamond reactor for studies of unusual gas chemistries and n-type doping. This is limited to substrate areas of about 1 cm2, and has a diamond growth rate around 0.5 μm h-1. But it is a very cheap, flexible and reliable reactor suitable for proof-of-principle experiments and trying out novel ideas.

HF Reactor 2 - another small hot filament CVD diamond reactor dedicated for depositing B-doped diamond films using diborane as the B supply. This reactor is also limited to substrate areas of about 1 cm2, and also has a diamond growth rate around 0.5 μm h-1. The B content of the films can be controlled between 1018 and 1021 cm-3, which is from lightly semiconducting to near-metallic conductivity.
Thomas Swan HFCVD reactor MW CVD reactor
'The Toaster' - a larger hot filament reactor which can deposit diamond onto wires and fibres. The machine was originally designed by the company Thomas Swan, but has been modified substantially since then. It holds two filaments, each of which is surrounded by 30-40 tungsten wires (10 cm long) which can be simultaneously coated in diamond. The growth rate is still only 0.5 μm h-1, but it is fully interlocked so it can be left running continuously for many days allowing diamond film thicknesses of 100 μm to be deposited.

MW Reactor 1 - a 2.5 kW microwave PECVD reactor with a substrate area of about 2 cm2 which can grow undoped diamond at up to 20 μm h-1. (a) magnetron, (b) waveguide, (c) optical pyrometer, (d) gas inlet, (e) vacuum exhaust pump, (f) gas inlet, (g) vacuum chamber, (h) water cooled base plate, (i) water cooling system.

MW CVD reactor 2 The 'Minion' DC plasma reactorRipples in the DC plasma

MW Reactor 2 - a 3 kW microwave plasma system with a substrate area of about 2 cm2 which can grow B-doped diamond at up to 20 μm h-1.

The 'Minion' - a DC plasma deposition system for growing polycrystalline diamond wafers at high growth rates on Si or Mo substrates or WC cutting tools.

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